https://nanyte.com/photoresists/ma-p-1275hv · last updated 2026-09-13
- Manufacturer
- micro resist technology GmbH
- Tone
- positive
- Chemistry
- DNQ-novolak
- Thickness
- 11–50 µm
- Applications
- Electroplating / molding · Etch mask
Cross-checked — two independent extractions agree on the spin curve and the single-value figures.
- Substrate
- Resist
- Exposed
Spin coating
Data points
| Series | rpm | µm |
|---|---|---|
| ma-P 1275 HV, 60 s spin time | 380 | 50 |
| 450 | 40 | |
| 600 | 30 | |
| 1000 | 20 |
Values are the manufacturer’s starting points, not a guarantee — characterize on your own tool.
transcribed from the Film thicknesses table, p.2 of the ma-P 1200 series product sheet (ls.24.02.01) — the four ma-P 1275 HV entries tabulated at a 60 s spin time. The 11 µm entry is at 30 s and is kept out of this series.
- Four entries at a 60 s spin time form a real series: 50 µm at 380 rpm, 40 µm at 450, 30 µm at 600 and 20 µm at 1000.
- The fifth, 11 µm at 3000 rpm, uses a 30 s spin and is left out of it.
- The practical difference from standard ma-P 1275 is where the thicknesses land: HV reaches 20 µm at 1000 rpm where 1275 needs 500 rpm, and 40 µm at 450 rpm where 1275 needs 250.
- The sheet's smooth-line chart adds no numeric data.
- Adhesion
- HMDS not required — Not addressed in this product sheet.
Soft bake
- Soft bake
- Not published — characterize on-tool
Exposure dose
No exposure dose is published for ma-P 1275 HV at any thickness. The sheet's example structures were all made on a mask aligner with broadband exposure, so a broadband dose matrix is the place to start. Run a dose array on your own tool to land the working dose.
Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.
Development
Not published for this resist: Developer, Dilution, Time, Method, Rinse — characterize on-tool.
SOURCE: Unique features / Characteristics, p.1-2 of the ma-P 1200 series product sheet (ls.24.02.01)
Hard bake, etch & strip
- Etch resistance
- "High dry and wet etch resistance" and "High stability in acid and alkaline plating baths" (Characteristics, p.2).
Not published for this resist: Hard bake, Descum, Stripper, Storage — characterize on-tool.
Where it's used
Practical notes from the datasheet
ma-P 1275 HV is the high-viscosity sibling of ma-P 1275, sold for the same job — moulds for electroplated microstructures — but with a higher viscosity that reaches a given thickness at a higher spin speed. It covers 11 µm at 3000 rpm and 20-50 µm between 1000 and 380 rpm, where the standard grade needs 250-500 rpm for its thicker films and stops at 40 µm. The sheet shows it at 50 and 56 µm, and electroplated nickel structures up to 48 µm tall from it. It shares the series characteristics: high stability in plating baths, high dry and wet etch resistance, sidewalls up to 87° with broadband exposure, and suitability for reflow. What it lacks is any published exposure dose, so dose has to be found on-tool; the sheet also gives no softbake, developer product or develop time.
Grades in this family
Other grades in the ma-P 1200 series line differ mainly in coating thickness:
Sources & disclaimer
- micro resist technology GmbH — ma-P 1275 HV datasheet (ls.24.02.01 (printed on both pages)) · accessed 2026-09-10
- https://kayakuam.com/products/ma-p-1200/ — kayakuam.com states 'ma-P 1200 is a positive tone DNQ/novolac based resist series'; the basis for classifying the ma-P 1200 grades as dnq-novolak.
Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-09-13.