Maskless lithography: how it works
How DMD and laser direct-write exposure work, grayscale patterning, resolution limits, and when maskless beats photomasks or e-beam.
BEAM vs benchtop laser writers
How BEAM compares as an alternative to established laser writers and maskless aligners — with a checklist for comparing any vendor’s quote.
Photoresist process recipes
Spin curves, bake schedules, exposure dose and development for 93 common resists — every value cited to the manufacturer’s datasheet, filterable by application and thickness.
Photoresist processing guidelines
Practical cleanroom guidance for coating, baking, exposing and developing photoresists — the parameters and failure modes a datasheet leaves out.
Photoresist tutorials
Step-by-step process tutorials — your first pattern on a maskless tool, spin coating your first wafer, and choosing a photoresist.
Photolithography glossary
Definitions for the terms used across the recipe library and processing guidelines — from adhesion promoter to undercut.
Vacuum chuck guide
When a vacuum chuck genuinely helps in lithography, when it physically cannot hold a sample, and how a stage with controlled motion holds parts without one.
Direct support
Technical questions, error logs, or anything else — we respond within 1–2 business days.
Remote support tool
Download the Windows tool that lets a NANYTE engineer connect to your BEAM PC and help you directly.
BEAM datasheet (PDF)
Full specifications as a PDF — instant download after entering a work email. Public specs are on the site.
Documentation & application notes
Operating manuals, software guides, process recipes, and dose-calibration notes for BEAM platforms.
Software support
Latest BeamXplorer builds, release notes, and software-side troubleshooting.