https://nanyte.com/photoresists/ma-p-1215 · last updated 2026-07-12
- Manufacturer
- micro resist technology GmbH
- Tone
- positive
- Chemistry
- DNQ-novolak
- Thickness
- 1.5 µm
- Exposure dose
- 45 mJ/cm²
- Applications
- Etch mask · Electroplating / molding
Unverified — not yet human-checked; values transcribed from the datasheet, characterize on-tool.
Spin coating
The manufacturer does not publish a spin curve for ma-P 1215. The 'Positive Photoresist Series' table (p.1) lists ma-P 1205/1210/1215/1225/1240/1275 side by side, each with exactly one film-thickness value, all coated at the SAME condition: 3000 rpm, 30 s spin time. For ma-P 1215 that is 1.5 µm — a single anchor point, not a spin-speed sweep, so per protocol no curve is published (a one-point series is not a curve). A separate figure titled 'ma-P 1200 series — Spin curves, 30 s spin time' (p.1) plots film thickness vs. spin speed (1000–6000 rpm) for all six grades on one chart with a color-coded legend (ma-P 1275/1240/1225/1215/1210/1205, in that order, thickest to thinnest). This extraction did NOT attempt to read numeric points off that figure: the PDF's text layer returns only the axis tick labels (0–16 µm, 1000–6000 rpm) and the legend strings, not the underlying vector-curve geometry, so any per-grade value would be an unverifiable eyeball guess on a multi-grade chart — exactly the failure mode flagged by the SU-8 2050 (20–42% error) and combined-trace LOR 3A precedents. A human with the rendered PDF open could read this figure directly for a tighter thicknessRange. No accel, dispense volume, edge-bead removal, or rehydration guidance is published anywhere in this document. The manufacturer's own feature list states 'No post exposure bake' for the whole ma-P 1200 series.
- Adhesion
- HMDS not required — Not mentioned in this document.
Soft bake
- Soft bake
- Not published — characterize on-tool
Exposure dose
The manufacturer publishes 45 mJ/cm² (Dose @ 365 nm (broadband exposure)). Dose scales with film thickness and depends on your optics, so treat it as a starting point and run a dose array.
- As published
- Dose @ 365 nm (broadband exposure)
Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.
SOURCE: table "Positive Photoresist Series", p.1 of ma-P.pdf, ma-P 1215 column
Development
Not published for this resist: Developer, Dilution, Time, Method, Rinse — characterize on-tool.
SOURCE: bullet "Aqueous alkaline development", p.1 of ma-P.pdf
Hard bake, etch & strip
- Etch resistance
Not published for this resist: Hard bake, Descum, Stripper, Storage — characterize on-tool.
Where it's used
ma-P 1215 is the 1.5 µm nominal-thickness member of micro resist technology's ma-P 1200 positive-tone series, a six-grade family (1205 through 1275) spanning 0.3–40 µm, all coated at the same 3000 rpm / 30 s condition per the family table. The manufacturer calls out "no post exposure bake" as a series-wide feature, which simplifies the process relative to resists that require a critical PEB step. Development is aqueous-alkaline, but this flyer names no specific developer product, dilution, or time — only a general process-flow diagram (coat, expose, develop) is shown. A multi-grade spin-speed curve (1000–6000 rpm, 30 s) is published for the whole family on one chart, but this extraction did not read individual trace values off it (see spinNotes) — a human QC pass with the rendered figure could tighten thicknessRange. The document also markets ma-P 1275 / ma-P 1275 HV as separate high-viscosity grades for electroplating molds up to 60 µm, but does not mention any 'ma-P 1275G' or grayscale variant. Chemistry classified as dnq-novolak from kayakuam.com's statement that ma-P 1200 is a 'positive tone DNQ/novolac based resist series' (chemistry classified 2026-07-12 from manufacturer SDS/TDS).
Sources & disclaimer
- micro resist technology GmbH — ma-P 1215 datasheet (20 June 2008) · accessed 2026-07-10
- https://kayakuam.com/products/ma-p-1200/ — kayakuam.com states 'ma-P 1200 is a positive tone DNQ/novolac based resist series'; the basis for classifying ma-P 1215 as dnq-novolak.
Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-07-12.