https://nanyte.com/photoresists/az-1505 · last updated 2026-07-12
- Manufacturer
- Merck (AZ Electronic Materials)
- Tone
- positive
- Chemistry
- DNQ-novolak
- Thickness
- 0.6–1.6 µm
- Developer
- AZ 300MIF, AZ 726MIF, AZ 917MIF, or AZ 400K
- Applications
- Etch mask · Electroplating / molding · General prototyping
Cross-checked — two independent extractions agree.
Spin coating
AZ 1505 is spin-coated to 0.6–1.6 µm. The curve below is redrawn from the manufacturer's published data — read your target thickness off the vertical axis and take the matching spin speed as a starting point.
Data points
| Series | rpm | µm |
|---|---|---|
| AZ 1505 as supplied | 500 | 1.6 |
| 1000 | 1.1 | |
| 1500 | 0.95 | |
| 2000 | 0.85 | |
| 2500 | 0.80 | |
| 3000 | 0.65 | |
| 3500 | 0.60 | |
| 4000 | 0.60 |
Values are the manufacturer's starting points, not a guarantee; verify on your own tool. Characterize on-tool. Series digitized from a published figure were independently cross-checked by a second blind read; treat those values as approximate (±10 %).
read from figure, "SPIN CURVES (150mm Wafers)" chart, p.1 of AZ 1500 Series Technical Datasheet (Merck, Rev. 03/21); AZ 1505 identified by its blue diamond legend marker, distinct from AZ 1512 (magenta square), AZ 1518 (red triangle) and AZ 1529 (green circle) plotted on the same axes. ADJUDICATED 2026-07-12 (third pixel read, WL directive: figure over table): the 3000/3500 rpm points were the crawl-era eyeball read and disagreed ~17% with the independent cross-check extraction; a fresh PyMuPDF pixel read of the embedded chart raster (axis calibrated from the y-axis tick-label text centroids -- value0 row=251, value10 row=51, 20 px/unit -- and the x-axis tick-label centroids -- rpm0 x=74.3, 0.1048 px/rpm; marker centroid taken as the column of maximum vertical run-length within +-7 px of each expected rpm column, i.e. the diamond's widest point, not the connecting line) reads 3000 rpm = 0.65 um, 3500 rpm = 0.60 um, 4000 rpm = 0.60 um -- confirming the crawl-era raw read erred (too high) and the cross-check extraction was essentially correct; 4000 rpm was also nudged from 0.65 to 0.60 um (not itself flagged as a >15% mismatch) because leaving it unchanged made the curve non-monotonic against the corrected 3500 rpm point, and the fresh pixel read independently supports 0.60 um there too (same marker column height/position as 3500 rpm).
Datasheet does not state spin ramp/acceleration, dispense volume, or static vs dynamic dispense for the spin-curve chart. Spin coating is named as one of several compatible coating methods (spray and roller coating are also mentioned, p.6 COATING) but no method-specific parameters are published beyond that. No edge-bead-removal recipe is given, only that AZ EBR Solvent or AZ EBR 70/30 are the companion EBR products (p.2).
- Adhesion
Soft bake
- Soft bake
- Not published — characterize on-tool
- Notes
SOURCE: TYPICAL PROCESS, p.1; PROCESS CONSIDERATIONS / SOFT BAKE, p.6
Exposure dose
The manufacturer does not publish a clearing dose for AZ 1505. Determine it with a dose array on your own tool.
- As published
Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.
Development
- Developer
- AZ 300MIF, AZ 726MIF, AZ 917MIF, or AZ 400K
- Dilution
- AZ 400K used 1:4 for tank immersion; dilution of the MIF developers is not stated in this datasheet.
- Time
- 60 s
- Developer family
- TMAH or buffered alkaline
Not published for this resist: Method, Rinse — characterize on-tool.
SOURCE: TYPICAL PROCESS, p.1; DEVELOPING, p.6
Hard bake, etch & strip
- Etch resistance
- Stripper
Not published for this resist: Hard bake, Descum, Storage — characterize on-tool.
SOURCE: HARD BAKE, p.6
Where it's used
AZ 1505 is the thinnest member of Merck's AZ 1500 series, a general-purpose positive DNQ/novolak-type resist family sold for demanding wet-etch masking where strong substrate adhesion matters (the datasheet's stripper guidance — removers "designed for DNQ/novolac type photoresists" — is the basis for this chemistry classification, since the document never states the chemistry as a standalone claim). Soft-bake, optional-PEB, and hard-bake temperatures are all given only as ranges (90-110°C, 105-115°C, 100-110°C respectively) rather than single set points, so a specific process must be optimized on-tool rather than read off this sheet verbatim. No exposure dose, PEB time, or storage/shelf-life data is published for AZ 1505 specifically — the only doses and resolution/depth-of-focus data in this datasheet were captured for the AZ 1512 and AZ 1518 grades, not AZ 1505. Develop is 60 s by puddle or immersion in a metal-ion-free (TMAH, e.g. AZ 300/726/917MIF) or inorganic (e.g. AZ 400K 1:4) developer, both explicitly supported. HMDS (or another suitable primer) is recommended ahead of coating on oxide-forming substrates such as silicon.
Sources & disclaimer
- Merck (AZ Electronic Materials) — AZ 1505 datasheet (Rev. (03/21)) · accessed 2026-07-10
Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-07-12.