https://nanyte.com/photoresists/ma-p-1240 · last updated 2026-09-13
- Manufacturer
- micro resist technology GmbH
- Tone
- positive
- Chemistry
- DNQ-novolak
- Thickness
- 4 µm
- Exposure dose
- 110 mJ/cm²
- Applications
- Etch mask · Electroplating / molding
- Substrate
- Resist
- Exposed
Spin coating
The manufacturer does not publish a spin curve for ma-P 1240.
- One tabulated point, not a sweep: the technical data table gives ma-P 1240 as 4 µm at 3000 rpm for 30 s, the single condition every grade in the series is listed at, and one anchor is not a curve.
- The sheet also plots film thickness against spin speed from 1000 to 6000 rpm for all six grades, but as smooth lines with no markers and no numeric table, so no values are published from it.
- Accel, dispense volume and edge-bead removal are not published.
- Adhesion
- HMDS not required — Not addressed in this product sheet.
Soft bake
- Soft bake
- Not published — characterize on-tool
Exposure dose
The manufacturer publishes 110 mJ/cm². Dose scales with film thickness and depends on your optics, so treat it as a starting point and run a dose array.
- As published
- 110 mJ/cm² is the published dose for ma-P 1240, measured under broadband exposure with the meter reading the 365 nm line rather than specified as a monochromatic i-line dose.
Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.
SOURCE: Technical data table, p.1 of the ma-P 1200 series product sheet (ls.24.02.01), ma-P 1240 column
Development
Not published for this resist: Developer, Dilution, Time, Method, Rinse — characterize on-tool.
SOURCE: Unique features / Characteristics, p.1-2 of the ma-P 1200 series product sheet (ls.24.02.01)
Hard bake, etch & strip
- Etch resistance
- "High pattern stability in wet etch processes and acid and alkaline plating baths" and "Highly stable in dry etch processes e.g. CHF3, CF4, SF6" (Unique features, p.1).
Not published for this resist: Hard bake, Descum, Stripper, Storage — characterize on-tool.
Where it's used
Practical notes from the datasheet
ma-P 1240 is the four-micron grade of the standard ma-P 1200 series — not to be confused with ma-P 1240G, a separately formulated greyscale resist of similar thickness. The number to notice is the dose: at 110 mJ/cm² it is double what ma-P 1225 needs, a much larger jump than the 1.5 µm of extra film would suggest, so exposure time roughly doubles when stepping up to this grade. What that buys is a mould thick enough for substantial electroplating and an etch mask with real margin; the sheet's example is 3 µm lines on 5 µm spaces in a 4 µm film. Development is aqueous alkaline, and the sheet publishes no softbake, developer product or develop time.
Grades in this family
Other grades in the ma-P 1200 series line differ mainly in coating thickness:
Sources & disclaimer
- micro resist technology GmbH — ma-P 1240 datasheet (ls.24.02.01 (printed on both pages)) · accessed 2026-09-10
- https://kayakuam.com/products/ma-p-1200/ — kayakuam.com states 'ma-P 1200 is a positive tone DNQ/novolac based resist series'; the basis for classifying the ma-P 1200 grades as dnq-novolak.
Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-09-13.