New here? Start with your first pattern below. For the principle behind each step see the processing guidelines; for the numbers, the recipe library; for the vocabulary, the glossary.
Your first pattern on a maskless tool
A beginner's step-by-step walkthrough of your first photolithography pattern on a maskless direct-write tool: choose a resist, coat, expose, develop and inspect.
Start the tutorial →Spin coating your first wafer
A step-by-step look at spin coating a wafer: dispense, spread, spin to final speed, remove the edge bead, soft-bake, and inspect for spin defects.
Start the tutorial →Choosing a photoresist
How to choose a photoresist: work through tone, film thickness, application and chemistry family, each routed to a filtered view of the recipe library.
Start the tutorial →Jump to the right place
Already know what you need? Go straight to the filtered recipe library or the resist-class explainer for the family you’re working with.
Pattern it at 365 and 405 nm
NANYTE BEAM is a desktop maskless lithography system with software-selectable dual-wavelength exposure and 16-bit grayscale — no photomask, no mask cost, same-day iteration.
General photolithography reference material, not a specification of any particular NANYTE BEAM configuration. Product names and trademarks belong to their respective owners; NANYTE is not affiliated with the manufacturers mentioned.