New here? Start with your first pattern below. For the principle behind each step see the processing guidelines; for the numbers, the recipe library; for the vocabulary, the glossary.
Your first pattern on a maskless tool
A beginner's step-by-step walkthrough of your first photolithography pattern on a maskless direct-write tool: choose a resist, coat, expose, develop and inspect.
Start the tutorial →Spin coating your first wafer
A step-by-step look at spin coating a wafer: dispense, spread, spin to final speed, remove the edge bead, soft-bake, and inspect for spin defects.
Start the tutorial →Choosing a photoresist
How to choose a photoresist: work through tone, film thickness, application and chemistry family, each routed to a filtered view of the recipe library.
Start the tutorial →Using photoresist as an etch mask
Use photoresist as an etch mask: matching adhesion, selectivity and hard bake to a wet or dry etch, sizing thickness, and a full clean-to-strip walkthrough.
Start the tutorial →Lift-off lithography, step by step
How to run a lift-off process: the undercut mechanism, single-layer, bilayer and image-reversal routes, metal-deposition limits, and a step-by-step flow.
Start the tutorial →Photoresist moulds for electroplating
How to build a photoresist mould for electroplating: mould requirements, choosing a thick resist, and the seed, coat, expose, develop, plate and strip flow.
Start the tutorial →Photoresist for microfluidics: master moulds and channels
Photoresist for microfluidics: SU-8 master moulds for PDMS soft lithography, resist as permanent channel walls, channel-height control and the mould flow.
Start the tutorial →Permanent photoresist as a MEMS structural material
Using photoresist as a MEMS structural material: sacrificial versus permanent roles, why cross-linked epoxy like SU-8 is unstrippable, and multi-layer release.
Start the tutorial →High-aspect-ratio photoresist patterning
High-aspect-ratio photoresist patterning: what aspect ratio means, why deep narrow features are hard, and which resists reach 10:1 and beyond.
Start the tutorial →Grayscale lithography: 3D structures in photoresist
How grayscale lithography builds 3D structures in photoresist: dose-per-pixel to depth-per-dose, which resists suit grayscale, and on-tool calibration.
Start the tutorial →Image reversal lithography, step by step
Image reversal lithography, step by step: pattern expose, reversal bake, flood expose and develop a positive resist into an undercut lift-off profile.
Start the tutorial →Jump to the right place
Already know what you need? Go straight to the filtered recipe library or the resist-class explainer for the family you’re working with.
Pattern it at 365 and 405 nm
NANYTE BEAM is a desktop maskless lithography system with software-selectable dual-wavelength exposure and 16-bit grayscale — no photomask, no mask cost, same-day iteration.
General photolithography reference material, not a specification of any particular NANYTE BEAM configuration. Product names and trademarks belong to their respective owners; NANYTE is not affiliated with the manufacturers mentioned.