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Ordyl Alpha 900 process recipe

Alpha 900 is the workhorse of Elga's Ordyl dry-film range: a negative, aqueous-developed film sold in five sheet thicknesses from 20 to 60 µm for everyday copper etching, tenting and plating. Its exposure windows are low (20-50 mJ/cm² to 8 steps of a Stouffer 21 tablet), the lowest quoted doses of the three Ordyl films, though each sheet states its dose against a different step-tablet target.

https://nanyte.com/photoresists/ordyl-alpha-900 · last updated 2026-10-15

At a glance
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Manufacturer
Elga Europe
Tone
negative
Thickness
20–60 µm
Developer
Na2CO3 0.8-1.2 % (optimum 0.9 %, 29 °C) or K2CO3 0.6-1.0 % (optimum 0.8 %, 28 °C)
Applications
Etch mask · Electroplating / molding

Cross-checked — the spin curve (where published) and the single-value figures were read twice, independently, from the datasheet, with any disagreement settled against it.

The exposed resist stays after development; the unexposed film dissolves. Schematic cross-sections for Ordyl Alpha 900 — feature width, film aspect ratio and sidewall angle are illustrative, not to scale.
—01 / Coating

Coating — dry-film lamination

Ordyl Alpha 900 is supplied as a pre-cut dry-film sheet and applied by hot-roll lamination — it is not spin-coated. Thickness is fixed per sheet, 20–60 µm, selected by sheet rather than by spin speed.

  • Alpha 900 goes on with a hot-roll laminator; there is nothing to spin and the sheet sets the thickness.
  • The panel must be completely dry.
  • Both laminator types run the hot roll at 105-125 °C and 1-3 m/min (3-10 ft/min), with an optional pre-heat.
  • Roll pressure is 2.5-3.5 bar (36-50 psi) on a manual machine and 2.5-6.0 bar (36-87 psi) on an automatic one, which adds a seal step of 1-4 s at 40-80 °C and 3.0-6.0 bar (44-87 psi).
  • Exit temperature of the panel should be 50-70 °C on inner layers and 45-60 °C on outer layers.
  • Wait at least 20 minutes after lamination (or until the panel is at room temperature) and no more than 1 week before exposing.
  • (Process Information, p.2.)
Adhesion
No adhesion promoter is mentioned. The sheet states very good adhesion on copper and names the surfaces it covers: vendor copper, electroless and panel-plated copper (unscrubbed or pumice-and-brush treated) and chemically microetched copper. Thorough cleaning before lamination is recommended (Product Description, p.1; Process Information, Surface preparation, p.2).
—02 / Bake

Soft bake

Soft bake
Not published — characterize on-tool
Notes
No bake step sits between lamination and exposure; the laminated film is exposed after its hold period.

SOURCE: Process Information, p.2-3 -- lamination and hold time lead directly to exposure

—03 / Exposure

Exposure dose

Ordyl Alpha 900's dose is published per sheet thickness, not as a single number. Read the row for the sheet you laminate and run a dose array around it.

As published
Dose follows the sheet: 20-25 mJ/cm² for the 20 µm film up to 45-50 mJ/cm² for the 60 µm film, each set to 8 solid steps on a Stouffer 21-step tablet, with a 360-380 nm lamp or laser.
Ordyl Alpha 900 — dose per sheet thickness
SheetDose
20 µm20–25 mJ/cm²
30 µm25–30 mJ/cm²
40 µm30–35 mJ/cm²
50 µm35–40 mJ/cm²
60 µm45–50 mJ/cm²
SOURCE: Exposure table 'Energy (mJ/cm2)', p.3, columns Alpha920 / 930…

Exposure table 'Energy (mJ/cm2)', p.3, columns Alpha920 / 930 / 940 / 950 / 960, 'referred to 8 Solid STEP of SST21'. The table carries no single wavelength; the text above it recommends lamps or a laser with an emission peak at 360-380 nm, so no wavelength is given here. Column-to-thickness pairing follows the table's own Resolution row (see thickness note).

—04 / Development

Development

Developer
Na2CO3 0.8-1.2 % (optimum 0.9 %, 29 °C) or K2CO3 0.6-1.0 % (optimum 0.8 %, 28 °C)
Method
spray
Rinse
Water rinse at 9-15 °dH (150-250 ppm CaCO3; optimum 12 °dH, 213 ppm), 15-25 °C with 20 °C optimum, in a rinse module no shorter than two thirds of the developing module.
Developer family
Buffered alkaline

Not published for this resist: Dilution, Time — characterize on-tool.

SOURCE: Developing and Developing time tables, p.3

—05 / Post-processing

Hard bake, etch & strip

Stripper
Strip in NaOH or KOH, 1.0-3.0 %, at 40-60 °C, spray pressure 1.5-4.0 bar (22-58 psi), break point 40-60 %, with Ordyl Antifoam C. The data sheet prints a strip-curve graph (p.4) that plots strip time against NaOH concentration from about 1 to 3 %. Read off the graph, Alpha 940 strips in roughly 170 s at 1 % and 40 s at 3 %, Alpha 960 in roughly 390 s at 1 % and 105 s at 3 %. These are figure reads (about +/-10 %) from a laboratory dip test. The same graph shows chip size growing with NaOH concentration. A proprietary stripper (Ordyl Stripper 5600) gives smaller flakes and faster stripping with less copper oxidation and less tin / tin-lead attack. (Stripping, p.4.)

Not published for this resist: Hard bake, Descum, Etch resistance, Storage — characterize on-tool.

SOURCE: Whole data sheet -- no hardbake or post-develop bake appears

—06 / Applications

Where it's used

Practical notes from the datasheet

Alpha 900 is billed as the universal film in Elga's line, aimed at the most common PCB jobs: acid etching, tenting, and copper, tin and tin/lead plating. The datasheet calls out high flexibility and conformability, good polymerisation through the full film depth, and easy stripping in small flakes; tenting over large tooling holes is possible from 40 µm film upward. Resolution is simply the sheet thickness: 20 µm lines on the 20 µm film, up to 60 µm on the 60 µm film (p.3). The 20 µm sheet is flagged as the ultra-fine-line option and the other four as standard. Like its siblings it is written for copper-clad boards on production lines, so the spray-pressure and break-point settings assume a conveyorised developer. Storage details are in a separate Ordyl specification form, not in this sheet.

—07 / Troubleshooting

Troubleshooting

Common failure modes for Ordyl Alpha 900, answered from the manufacturer's datasheet and application notes. These are starting points — your substrate, tooling and environment shift the specifics, so calibrate on-tool.

The strip is slow and the flakes are large. How do I change that?

Raise the NaOH concentration. On the Alpha 940/950/960 strip graph, strip time falls steeply between 1 % and about 2 % NaOH and flattens out toward 3 %, while chip size grows, so a stronger bath strips faster but leaves bigger flakes. The data sheet's alternative is its proprietary stripper, which it offers for smaller flakes and faster stripping with less copper oxidation.

SOURCE: 900 Product Data Sheet

Elga Europe, Ordyl Alpha 900 Product Data Sheet Ed. 05 (28 August 2019) -- Stripping, graph 'Stripping Time/Chip Size with different NaOH Concentration' and Proprietary strippers, p.4

—08 / Sources

Sources & disclaimer

Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-10-15.

Cite this recipe

NANYTE. "Ordyl Alpha 900 process recipe." NANYTE Photoresist Library. https://nanyte.com/photoresists/ordyl-alpha-900. Accessed 2026-10-15.

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