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K-PRO series process recipe

A series of thick-film positive photoresists (K-PRO 1 through K-PRO 15) covering 1-25 µm in a single coat, aimed at plating, bumping and TSV work. Developed in TMAH- or KOH-based developers, and no post-exposure bake is required.

https://nanyte.com/photoresists/k-pro · last updated 2026-08-04

At a glance
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Manufacturer
KemLab, Inc.
Grades
K-PRO 1 · K-PRO 2 · K-PRO 3 · K-PRO 5 · K-PRO 7 · K-PRO 151
Tone
positive
Thickness
1–25 µm
Developer
0.26N TMAH
Applications
Electroplating / molding · Etch mask · High aspect ratio
The exposed resist dissolves in the developer; the unexposed film stays. Schematic cross-sections for K-PRO series — feature width, film aspect ratio and sidewall angle are illustrative, not to scale.
01 / Coating

Spin coating

For the K-PRO series spin curve, work from the manufacturer's datasheet and characterize film thickness on your own coater.

Adhesion
HMDS recommended — HMDS primer is recommended with oxide-forming substrates such as silicon (TDS p.2, Substrate Preparation); K-PRO adheres to silicon, copper, gold, glass, aluminum and chromium, and the datasheet claims excellent substrate adhesion for wet-etch work.
Rehydration
3-30 minutes at 35-50% relative humidity, scaling with film thickness (TDS p.2, Rehydration Time). The p.1 table pins it per process point: 3 min up to 3 µm, 5 min at 4 µm, 15 min at 7 µm, 30 min at 15 and 25 µm. A thick DNQ-type film that has not rehydrated will develop slowly and scum, so this step is not optional on the thicker grades.
02 / Bake

Soft bake

Soft bake
115 °C · 2–5 min · hotplate
Notes
Narrative Softbake section (p.2): 'Recommended softbake contact hotplate temperature is 115°C. Typical bake time is 2 – 5 minutes.' No single typical time is named, so the published 2-5 min window is recorded rather than a scalar. The p.1 Processing Guidelines table gives the per-thickness times at that same 115°C: 2 min at 1, 2 and 3 µm; 2.5 min at 4 µm; 3 min at 7 µm; 4 min at 15 µm; and 5.5 min at 25 µm — the 25 µm point sits above the narrative window.

SOURCE: Softbake section, p.2, and Processing Guidelines table, p.1, of the K-PRO TDS Rev 3-2021.

03 / Exposure

Exposure dose

K-PRO series's dose is published against film thickness, not as a single number. Read the row for the film you coat and run a dose array around it.

As published
Broadband aligner dose climbs steeply with the coat — 65 mJ/cm² at 1 µm, 125 at 7 µm, 380 at 25 µm. No i-line or g-line number is published, so read the row for your film and bracket it with a dose array.
K-PRO series — dose by film thickness
Film thicknessDose
1 µm65 mJ/cm²
2 µm72 mJ/cm²
3 µm76 mJ/cm²
4 µm80 mJ/cm²
7 µm125 mJ/cm²
15 µm210 mJ/cm²
25 µm380 mJ/cm²

SOURCE: 'Broadband Aligner Exposure' column of the Processing Guidelines table, p.1 of the K-PRO TDS Rev 3-2021.

04 / Development

Development

Developer
0.26N TMAH
Developer family
TMAH or buffered alkaline

Not published for this resist: Dilution, Time, Method, Rinse — characterize on-tool.

SOURCE: Development section, p.3, and the Features block, p.1, of the K-PRO TDS Rev 3-2021.

05 / Post-processing

Hard bake, etch & strip

Etch resistance
Wet chemical etchants for Au, Cu, Cr and Al do not degrade patterns made with K-PRO (TDS p.3, Etch Resist).
Stripper
Industry-standard removers such as NMP at 50-80°C (TDS p.3, Resist Removal). Thicker films may benefit from a two-bath process — the first bath takes off the bulk, the second cleans up.
Storage
Store upright in an airtight container at 4-21°C, away from light, oxidizers, acids, bases and ignition sources (TDS p.3, Storage).

Not published for this resist: Hard bake, Descum — characterize on-tool.

06 / Applications

Where it's used

Practical notes from the datasheet

K-PRO is KemLab's advanced-packaging positive series — six grades sharing one process family, aimed at plating, bumping, TSV and other metal-deposition work rather than at general lithography. Two things set it apart from a conventional thick positive resist. First, no post-exposure bake is required at all, which removes a step and its associated stress from the flow. Second, rehydration is an explicit, thickness-dependent process step (3 min at 1-3 µm rising to 30 min at 15-25 µm, at 35-50% RH) rather than an afterthought — skip it on the thick grades and development slows and scums. Broadband dose climbs steeply with the coat, from 65 mJ/cm² at 1 µm to 380 at 25 µm, so a dose array around the tabulated row for your film is the practical starting point. The grade numbers are product names, not thicknesses: K-PRO 5 is tabulated at 4 µm and K-PRO 15 covers both the 15 and 25 µm process points. Compatibility with copper, pure tin and nickel plating chemistries is claimed by the manufacturer, as is wet-etch resistance to Au, Cu, Cr and Al etchants; both are worth confirming against your own bath.

07 / Sources

Sources & disclaimer

Cited above
  1. K-PRO TDS Rev 3-2021, 'PROCESSING GUIDELINES' table (p.1), Product column: K-PRO 1, K-PRO 2, K-PRO 3, K-PRO 5, K-PRO 7, K-PRO 15. The grade number does not track film thickness one-for-one — K-PRO 5 is tabulated at 4 µm, and K-PRO 15 carries two rows (15 µm and 25 µm) — so the numbers are product names, not thickness specifications.

Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-08-04.

Cite this recipe

NANYTE. "K-PRO series process recipe." NANYTE Photoresist Library. https://nanyte.com/photoresists/k-pro. Accessed 2026-08-04.

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