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Etertec UDH5600 process recipe

Etertec UDH5600 is a thin negative dry film for UV laser direct imaging at 365 and 405 nm, offered in just two sheets, 25 and 30 µm, for fine-line IC-substrate work. It develops in carbonate and is rated for acid etching and acid plating.

https://nanyte.com/photoresists/etertec-udh5600 · last updated 2026-10-15

At a glance
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Manufacturer
Eternal Materials
Tone
negative
Thickness
25–30 µm
Developer
Na2CO3 0.7-1.0 % (optimum 0.85 %) or K2CO3 0.8-1.2 % (optimum 1.0 %)
Applications
Etch mask · Electroplating / molding

Cross-checked — the spin curve (where published) and the single-value figures were read twice, independently, from the datasheet, with any disagreement settled against it.

The exposed resist stays after development; the unexposed film dissolves. Schematic cross-sections for Etertec UDH5600 — feature width, film aspect ratio and sidewall angle are illustrative, not to scale.
—01 / Coating

Coating — dry-film lamination

Etertec UDH5600 is supplied as a pre-cut dry-film sheet and applied by hot-roll lamination — it is not spin-coated. Thickness is fixed per sheet, 25–30 µm, selected by sheet rather than by spin speed.

  • A laminated film on dry, clean panels, with no spin step.
  • Hot roll 90-120 °C, 2.5-3.5 bar (36-50 psi), 1-3 m/min (3-10 ft/min), identical for manual and automatic laminators
  • pre-heat optional; exit temperature 40-65 °C. Automatic lines also seal at 60-80 °C, 3.0-6.0 bar (44-87 psi) for 1-4 s.
  • Roll and panel cleanliness matter because dirt, copper or epoxy-glass slivers and resist chips cause pinholes.
  • After lamination, rack the panels with a gap between each; stacking prints trapped particles from one board into the next and traps heat that interferes with exposure and develop.
  • Hold at least 20 min, or as long as it takes the panels to reach room temperature.

SOURCE: Lamination, p.2.

Adhesion
No adhesion promoter is specified. The film is stated to adhere to vendor copper, electroless and panel-plated copper (as received or pumice/brush scrubbed), direct-metallization surfaces and microetched copper, provided the surface is cleaned well (Surface preparation, p.1). Nothing is stated for substrates other than copper.
—02 / Bake

Soft bake

Soft bake
Not published — characterize on-tool
Notes
There is no bake between lamination and exposure; the only wait is the racked post-lamination hold (at least 20 min).

SOURCE: Lamination / Post lamination Hold Time, p.2

—03 / Exposure

Exposure dose

Etertec UDH5600's dose is published per sheet thickness, not as a single number. Read the row for the sheet you laminate and run a dose array around it.

Dose at 365 nm
Not published — characterize on-tool
As published
Both sheets, 25 and 30 µm, are given the same 45-120 mJ/cm² at 405 nm, aimed at steps 4-7 of a Stouffer 21 tablet on the resist (5-8 as seen on copper).
Etertec UDH5600 — dose per sheet thickness · at 405 nm
SheetDose
25 µm45–120 mJ/cm²
30 µm45–120 mJ/cm²
SOURCE: Exposure table, p.3, introduced as 'referred to exposure at…

Exposure table, p.3, introduced as 'referred to exposure at 405nm': 'Energy (mJ/cm2)' 45-120 for both UDH5625 (25 µm) and UDH5630 (30 µm).

—04 / Development

Development

Developer
Na2CO3 0.7-1.0 % (optimum 0.85 %) or K2CO3 0.8-1.2 % (optimum 1.0 %)
Method
spray
Rinse
Water rinse of 9-15 °dH hardness (150-300 ppm CaCO3, optimum 12 °dH), preferably at 15-25 °C (optimum 20 °C), in a rinse module at least two thirds the length of the developer module.
Developer family
Buffered alkaline

Not published for this resist: Dilution, Time — characterize on-tool.

SOURCE: Developing, p.4 (conditions table, develop-time table, dry-film load, antifoam and maintenance notes)

—05 / Post-processing

Hard bake, etch & strip

Etch resistance
Stated to have high chemical resistance to acid etchants; no etchant chemistries, concentrations or etch times are listed.
Stripper
Strips by immersion or conveyor in 2.0-5.0 % caustic (NaOH or KOH) or a proprietary stripper (Ordyl Stripper 5600 is named). The strip table, for 2-5 % NaOH at 40-60 °C and 1.0-3.0 bar (15-45 psi), gives 42-58 s for UDH5625 and 61-74 s for UDH5630. Strip time moves with caustic concentration, temperature, plating overhang height, spray pressure, exposure level and hold time before strip.1

Not published for this resist: Hard bake, Descum, Storage — characterize on-tool.

—06 / Applications

Where it's used

Practical notes from the datasheet

UDH5600 is the finest-line member of this set: two thin sheets (25 and 30 µm) aimed at IC substrates, with exposure written for UV laser direct imaging. It is also the only one of the three here whose energy table is explicitly tagged 405 nm. The datasheet adds two line-width-versus-step charts for each sheet (p.3): at 10, 13, 16 and 19 held Stouffer-41 steps the adhesion line width is 7, 5, 4.5 and 4 µm for UDH5625 (lines/spaces X/300 µm) and 10, 6.5, 6 and 5 µm for UDH5630, while the resolution line/space values are 7, 5.5, 6.5 and 9 µm for UDH5625 and 10, 6.5, 7.5 and 11 µm for UDH5630. Plating is the named strength: the film is said to perform well in copper sulphate, tin/lead, bright acid tin, nickel sulfamate and acid gold baths. Its hot-roll window, 90-120 °C, is lower than the 105-125 °C the two Ordyl AM datasheets give. No storage life, spin, bake or non-copper substrate data are given.

—07 / Troubleshooting

Troubleshooting

Common failure modes for Etertec UDH5600, answered from the manufacturer's datasheet and application notes. These are starting points — your substrate, tooling and environment shift the specifics, so calibrate on-tool.

I see pinholes in the developed film. What does the datasheet point to?

Dirt on the panel or the rollers. The sheet says both must be clean, since dirt, copper or epoxy-glass slivers and resist chips all cause pinholes. It also says to rack laminated panels with a gap between them rather than stacking, because stacking presses trapped particles into the next board's resist.

SOURCE: UDH5600 Product Data Sheet

Elga Europe, Etertec UDH5600 Product Data Sheet, Edition 01 (October 2023) - Lamination: Cleanliness and Post lamination Hold Time, p.2

Develop quality drifts after weeks of running. What maintenance is listed?

Clean the develop machine once a week to remove carbonate salts and resist and antifoam residue. Keep the dry-film load in the developer at or under 3 g/l and run an antifoam as the datasheet recommends.

SOURCE: UDH5600 Product Data Sheet

Elga Europe, Etertec UDH5600 Product Data Sheet, Edition 01 (October 2023) - Developing: Developer Maintenance and load note, p.4

—08 / Sources

Sources & disclaimer

Cited above
  1. Stripping, p.5.

Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-10-15.

Cite this recipe

NANYTE. "Etertec UDH5600 process recipe." NANYTE Photoresist Library. https://nanyte.com/photoresists/etertec-udh5600. Accessed 2026-10-15.

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