https://nanyte.com/photoresists/ma-n-440 · last updated 2026-10-15
- Manufacturer
- micro resist technology
- Tone
- negative
- Thickness
- 2.9–7.1 µm
- Applications
- Etch mask · Lift-off
Cross-checked — the spin curve (where published) and the single-value figures were read twice, independently, from the datasheet, with any disagreement settled against it.
- Substrate
- Resist
- Exposed
Spin coating
Data points
| Series | rpm | µm |
|---|---|---|
| ma-N 440 | 1000 | 7.1 |
| 2000 | 5.0 | |
| 3000 | 4.1 | |
| 4000 | 3.5 | |
| 5000 | 3.1 | |
| 6000 | 2.9 |
Values are the manufacturer’s starting points, not a guarantee — characterize on your own tool. Series digitized from a published figure are approximate (±10 %).
read from figure — the ma-N 400 spin-speed chart on p.1 of micro resist technology's 'ma-N 400 and ma-N 1400 - Negative Tone Photoresists' sheet (film thickness 0–14 µm vs spin speed in min⁻¹, 1000–6000, linear axes), trace identified by legend as the red line 'ma-N 440', second from the top below ma-N 490. The chart is drawn as vector lines with no point markers, so the trace can be read exactly where it crosses each 1000 rpm gridline; nothing is read beyond the plotted 1000–6000 rpm. The thickness axis was checked against the sheet's own table: the same chart reads 4.07 µm for ma-N 440 at 3000 rpm against the table's 4.1 µm, and 7.4 µm for ma-N 490 against 7.5 µm. The chart does not print a spin time; the table's 4.1 µm is for 30 s.
- The sheet's only coating condition is the reference spin of 3000 rpm for 30 s, which gives 4.1 µm for this grade; the chart beside it plots 1000–6000 rpm without stating a spin time.
- There is no dispense volume, acceleration, edge-bead step or substrate preparation on the sheet.
- At the 4.1 µm reference the film is thicker than the 2 µm films shown in the sheet's profile photographs, so use the curve as a starting point and measure on your own coater.
- Adhesion
- Not addressed on the sheet.
Soft bake
- Soft bake
- Not published — characterize on-tool
Exposure dose
No dose is published for ma-N 440 or any ma-N 400 grade. The sheet gives a sensitivity window of 300–380 nm, which covers the i-line but ends below 405 nm. Run a dose array on your own tool to land the working dose.
Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.
Development
Not published for this resist: Developer, Dilution, Time, Method, Rinse — characterize on-tool.
SOURCE: Unique features, p.1: 'Aqueous alkaline development'
Hard bake, etch & strip
- Etch resistance
- The sheet lists high wet and dry etch resistance and names use as an etch mask for semiconductors and metals. No etch rates are published.
Not published for this resist: Hard bake, Descum, Stripper, Storage — characterize on-tool.
Where it's used
Practical notes from the datasheet
ma-N 440 is the second-thickest of the five ma-N 400 grades on the sheet (ma-N 405, 415, 420, 440, 490: 0.5, 1.5, 2.0, 4.1 and 7.5 µm at 3000 rpm for 30 s). The series is a negative-tone resist with aqueous alkaline development, good thermal stability of the pattern and a tunable profile from vertical to undercut. The sheet rates the ma-N 400 pattern stable up to 110 °C, enough for metal evaporation; the sturdier 160 °C figure that adds sputtering belongs to the ma-N 1400 series, not this one. Listed uses are microelectronics and microsystems, a mask for lift-off, an etch mask for semiconductors and metals, and implantation. The only profile data are photographs of a 2 µm ma-N 400 film: after 90 s of development there is no undercut, after 100 s about 0.5 µm and after 140 s about 1.5 µm. Those are for a thinner grade, with the developer and bakes unstated, so they show the trend, not a recipe for a 4.1 µm film. Soft bake, exposure dose, post-exposure bake and developer are not on the sheet.
Troubleshooting
Common failure modes for ma-N 440, answered from the manufacturer's datasheet and application notes. These are starting points — your substrate, tooling and environment shift the specifics, so calibrate on-tool.
Can I write ma-N 440 with a 405 nm source?
The sheet does not support it. It rates ma-N 400 for 300–380 nm, which is below 405 nm, and gives no dose at any wavelength. The 300–410 nm window on the same table belongs to the ma-N 1400 series. If your tool is 405 nm only, treat ma-N 440 as unrated there and run a dose test, or look at a grade whose sheet covers it.
SOURCE: ma-N 400 and ma-N 1400 sheet (micro resist technology GmbH…
ma-N 400 and ma-N 1400 sheet (micro resist technology GmbH, document code ls.15.06.18) — Technical data table, 'Spectral sensitivity' row, p.1
How do I get an undercut for lift-off with ma-N 440?
The sheet says the profile can be tuned from vertical to undercut and shows the trend on a 2 µm ma-N 400 film: 90 s of development gives no undercut, 100 s about 0.5 µm and 140 s about 1.5 µm. It does not say which developer or bakes produced those, and ma-N 440 is about twice as thick, so expect to find the develop time on test pieces and check the profile in section.
SOURCE: ma-N 400 and ma-N 1400 sheet (micro resist technology GmbH…
ma-N 400 and ma-N 1400 sheet (micro resist technology GmbH, document code ls.15.06.18) — profile photographs 'ma-N 400, 2 µm thick' and Unique features, p.1
Sources & disclaimer
- micro resist technology — ma-N 440 datasheet (Document code ls.15.06.18 printed on the sheet; no calendar date is printed) · accessed 2026-10-15
Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-10-15.