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Microposit S1818 process recipe

MICROPOSIT S1818 G2 is the thick-film grade of the MICROPOSIT S1800 G2 positive photoresist family — chosen when a single S1800 coat must be as thick as the series allows, for deeper etch masking or taller step coverage than the thinner S1805, S1811 and S1813 grades provide. It is the thickest of four undyed grades named in Rohm and Haas Electronic Materials' MICROPOSIT S1800 G2 positive photoresist datasheet (ME06N041, Rev. 0, October 2006), a g-line-optimized single-layer resist for IC device fabrication; it is the top trace on the series' film-thickness-vs-spin-speed chart, alongside S1805, S1811 and S1813 G2.

https://nanyte.com/photoresists/s1818 · last updated 2026-07-12

At a glance
Manufacturer
Rohm and Haas Electronic Materials
Tone
positive
Chemistry
DNQ-novolak

Unverified — not yet human-checked; values transcribed from the datasheet, characterize on-tool.

01 / Coating

Spin coating

Microposit S1818 is spin-coated to . The curve below is redrawn from the manufacturer's published data — read your target thickness off the vertical axis and take the matching spin speed as a starting point.

Spin curve for Microposit S1818: film thickness in µm against spin speed in rpm.0.001.02.03.02k3k4k5k6k7kSPIN SPEED (rpm)THICKNESS (µm)
Data points
Microposit S1818 — film thickness (µm) by spin speed (rpm)
Seriesrpmµm
S1818 G220002.6
30002.1
40001.9
50001.7
60001.6
70001.5

Values are the manufacturer's starting points, not a guarantee; verify on your own tool. Characterize on-tool. Series digitized from a published figure were independently cross-checked by a second blind read; treat those values as approximate (±10 %).

read from figure, 'MICROPOSIT S1800 G2 Photoresist Undyed Series Spin Speed Curves' (Figure 2), p.2 of MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and Haas Electronic Materials, ME06N041, Rev. 0, October 2006); identified as the highest of four plotted traces (diamond marker, legend order S1818/S1813/S1811/S1805 top-to-bottom by thickness — the four curves do not cross across the plotted range); read at gridline/marker crossings every 1,000 rpm from 2,000–7,000 rpm off a linear-linear chart (thickness 0–40,000 Å, spin speed 1,000–8,000 rpm); no numeric table accompanies the figure so no independent point-value anchor exists in the document — visual chart-reading only, typical uncertainty ~10–15%; digitized 2026-07-12

Redrawn from the manufacturer's published data — hover to read values between points, click to pin.

Figure 2 ('MICROPOSIT S1800 G2 Photoresist Undyed Series Spin Speed Curves', p.2) plots four traces — S1818 G2, S1813 G2, S1811 G2, S1805 G2 — on one axis (spin speed 1,000–8,000 rpm vs photoresist thickness 0–40,000 Å), each carrying a distinct legend marker (diamond, triangle, square, cross respectively, in that order top-to-bottom by thickness) and, because the four curves do not cross across the plotted range, S1818 G2 (diamond marker) is identified as the highest trace at every spin speed. The trace was digitized 2026-07-12 by reading gridline/marker crossings at 1,000 rpm intervals from 2,000–7,000 rpm (see spinCurves); no numeric thickness-vs-rpm table accompanies the figure, so there is no independent point-value anchor and the digitized values carry typical chart-reading uncertainty (~10–15% — see spinCurves[0].source). Table 2 (p.2) records that Figure 2's coatings used an SVG 81 coater and a 115°C/60 sec hotplate softbake on silicon, measured on a Nanometrics 210 — that condition applies to this grade's trace and is recorded under softbake below. The document states maximum coating uniformity is 'typically attained between the spin speeds of 3,500–5,500 rpm' (p.2, series-wide statement, not S1818-specific). No rehydration hold or edge-bead handling is discussed anywhere in the document.

Adhesion
HMDS recommended — "MICROPOSIT S1800 G2 Series Photoresist work well with the hexamethyldisilazane-based MICROPOSIT Primers. Concentrated MICROPOSIT Primer is recommended when vacuum vapor priming. Diluted primer is recommended for liquid phase priming applications." (SUBSTRATE PREPARATION, p.2 — series-wide statement, not grade-specific).
02 / Bake

Soft bake

Soft bake
115 °C · 60 s · hotplate
Notes
From Table 2 ('Process Conditions, Refer to Figure 2'): coat tool SVG 81, softbake 115°C/60 sec hotplate, measured on a Nanometrics 210. This is the condition used to generate the Figure 2 spin-speed-curve trace that includes S1818 G2; it is not a separately stated softbake recommendation outside that figure.

SOURCE: Table 2, p.2 of MICROPOSIT S1800 G2 SERIES PHOTORESISTS, ME06N041, Rev. 0, October 2006

03 / Exposure

Exposure dose

The manufacturer does not publish a clearing dose for Microposit S1818. Determine it with a dose array on your own tool.

As published
"MICROPOSIT S1800 G2 Series Photoresists can be exposed with light sources in the spectral output range of 350–450 nm. The exposure properties have been optimized for use at 436 nm." (EXPOSURE section, p.3 — series-wide statement; no wavelength-specific dose given for this grade).

Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.

04 / Development

Development

Not published for this resist: Developer, Dilution, Time, Method, Rinse — characterize on-tool.

05 / Post-processing

Hard bake, etch & strip

Stripper
"Residue-free photoresist removal using standard MICROPOSIT removers" (ADVANTAGES section, p.1) — no specific remover product is named.
Storage
"Store products in tightly closed original containers at temperatures recommended on the product label." (STORAGE section, p.5) — no specific temperature is printed in the document itself.

Not published for this resist: Hard bake, Descum, Etch resistance — characterize on-tool.

06 / Applications

Where it's used

This grade appears exactly once in the document: as the highest of four traces (alongside S1805, S1811 and S1813 G2) on the undyed-series film-thickness-vs-spin-speed chart (Figure 2, p.2). Pick S1818 G2 over its thinner S1805/S1811/S1813 siblings when the process needs the most film a single S1800 G2 coat can give — it sits at the top of the series' spin-speed chart, coating thickest of the four undyed grades at any given speed. No dose, develop time, or lithographic-performance data (contrast curve, Dill parameters, absorbance spectrum, masking linearity, exposure/focus latitude — Figures 4–9, Tables 4–9) is published for S1818 specifically; every one of those figures and tables explicitly names MICROPOSIT S1813 G2 as the tested grade, and none of that data may be borrowed here. The document states the S1800 G2 system broadly is optimized for g-line (436 nm) exposure and usable across 350–450 nm, is compatible with HMDS-based MICROPOSIT primers, and works with both metal-ion-free (MF-319 family) and metal-ion-bearing MICROPOSIT developers, but none of those statements carry an S1818-specific number. This recipe replaces an earlier extraction made from the superseded circa-1993 Shipley 'MPR S1800 1093' edition, per a WL decision on 2026-07-10; the S1800 line traces from Shipley through Rohm and Haas Electronic Materials (publisher of this G2 edition) to Dow, DuPont, and today's Kayaku Advanced Materials. Chemistry classified as dnq-novolak directly from the Dow/Rohm and Haas MICROPOSIT S1818 MSDS composition table (mixed cresol novolak resin + diazo photoactive compound) (chemistry classified 2026-07-12 from manufacturer SDS/TDS).

07 / Sources

Sources & disclaimer

Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-07-12.

Cite this recipe

NANYTE. "Microposit S1818 process recipe." NANYTE Photoresist Library. https://nanyte.com/photoresists/s1818. Accessed 2026-07-12.

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