https://nanyte.com/photoresists/s1818 · last updated 2026-07-26
- Manufacturer
- Rohm and Haas Electronic Materials
- Tone
- positive
- Chemistry
- DNQ-novolak
- Substrate
- Resist
- Exposed
Spin coating
Data points
| Series | rpm | µm |
|---|---|---|
| S1818 G2 | 2000 | 2.6 |
| 3000 | 2.1 | |
| 4000 | 1.9 | |
| 5000 | 1.7 | |
| 6000 | 1.6 | |
| 7000 | 1.5 |
Values are the manufacturer’s starting points, not a guarantee — characterize on your own tool. Series digitized from a published figure are approximate (±10 %).
read from figure, 'MICROPOSIT S1800 G2 Photoresist Undyed Series Spin Speed Curves' (Figure 2), p.2 of MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and Haas Electronic Materials, ME06N041, Rev. 0, October 2006); identified as the highest of four plotted traces (diamond marker, legend order S1818/S1813/S1811/S1805 top-to-bottom by thickness — the four curves do not cross across the plotted range); read at gridline/marker crossings every 1,000 rpm from 2,000–7,000 rpm off a linear-linear chart (thickness 0–40,000 Å, spin speed 1,000–8,000 rpm); no numeric table accompanies the figure so no independent point-value anchor exists in the document — visual chart-reading only, typical uncertainty ~10–15%.
- Figure 2 ('MICROPOSIT S1800 G2 Photoresist Undyed Series Spin Speed Curves', p.2) plots four traces — S1818 G2, S1813 G2, S1811 G2, S1805 G2 — on one axis (spin speed 1,000–8,000 rpm vs photoresist thickness 0–40,000 Å), each carrying a distinct legend marker (diamond, triangle, square, cross respectively, in that order top-to-bottom by thickness) and, because the four curves do not cross across the plotted range, S1818 G2 (diamond marker) is identified as the highest trace at every spin speed.
- The trace plotted here was read from gridline/marker crossings at 1,000 rpm intervals from 2,000–7,000 rpm; no numeric thickness-vs-rpm table accompanies the figure, so there is no independent point-value anchor and the values carry typical chart-reading uncertainty of about 10–15%.
- Table 2 (p.2) records that Figure 2's coatings used an SVG 81 coater and a 115°C/60 sec hotplate softbake on silicon, measured on a Nanometrics 210 — that condition applies to this grade's trace and is recorded under softbake below.
- The document states maximum coating uniformity is 'typically attained between the spin speeds of 3,500–5,500 rpm' (p.2, series-wide statement, not S1818-specific).
- No rehydration hold or edge-bead handling is discussed anywhere in the document.
- Adhesion
- HMDS recommended — "MICROPOSIT S1800 G2 Series Photoresist work well with the hexamethyldisilazane-based MICROPOSIT Primers.
Soft bake
- Soft bake
- 115 °C · 60 s · hotplate
- Notes
- From Table 2 ('Process Conditions, Refer to Figure 2'): coat tool SVG 81, softbake 115°C/60 sec hotplate, measured on a Nanometrics 210.
SOURCE: Table 2, p.2 of MICROPOSIT S1800 G2 SERIES PHOTORESISTS, ME06N041, Rev. 0, October 2006
Exposure dose
Exposure is optimized at 436 nm across the S1800 G2 series and usable from 350 to 450 nm, but that window is all S1818 gets: the sheet's dose numbers were measured on S1813 and belong to it. Run a dose array on your own tool to land the working dose.
Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.
Development
- Developer family
- TMAH or buffered alkaline
Not published for this resist: Developer, Dilution, Time, Method, Rinse — characterize on-tool.
Hard bake, etch & strip
- Stripper
- "Residue-free photoresist removal using standard MICROPOSIT removers" (ADVANTAGES section, p.1) — no specific remover product is named.
- Storage
- "Store products in tightly closed original containers at temperatures recommended on the product label." (STORAGE section, p.5) — no specific temperature is printed in the document itself.
Not published for this resist: Hard bake, Descum, Etch resistance — characterize on-tool.
Where it's used
Practical notes from the datasheet
This grade appears exactly once in the document: as the highest of four traces (alongside S1805, S1811 and S1813 G2) on the undyed-series film-thickness-vs-spin-speed chart (Figure 2, p.2). Pick S1818 G2 over its thinner S1805/S1811/S1813 siblings when the process needs the most film a single S1800 G2 coat can give — it sits at the top of the series' spin-speed chart, coating thickest of the four undyed grades at any given speed. No dose, develop time, or lithographic-performance data (contrast curve, Dill parameters, absorbance spectrum, masking linearity, exposure/focus latitude — Figures 4–9, Tables 4–9) is published for S1818 specifically; every one of those figures and tables explicitly names MICROPOSIT S1813 G2 as the tested grade, and none of that data may be borrowed here. The document states the S1800 G2 system broadly is optimized for g-line (436 nm) exposure and usable across 350–450 nm, is compatible with HMDS-based MICROPOSIT primers, and works with both metal-ion-free (MF-319 family) and metal-ion-bearing MICROPOSIT developers, but none of those statements carry an S1818-specific number. This recipe replaces an earlier extraction made from the superseded circa-1993 Shipley 'MPR S1800 1093' edition, per a WL decision on 2026-07-10; the S1800 line traces from Shipley through Rohm and Haas Electronic Materials (publisher of this G2 edition) to Dow, DuPont, and today's Kayaku Advanced Materials. Chemistry classified as dnq-novolak directly from the Dow/Rohm and Haas MICROPOSIT S1818 MSDS composition table (mixed cresol novolak resin + diazo photoactive compound).
Grades in this family
Other grades in the MICROPOSIT S1800 G2 Series line differ mainly in coating thickness:
| Grade | Thickness | Exposure dose |
|---|---|---|
| S1813 | 1.0–1.9 µm | 150 mJ/cm² @ 436 nm |
| Microposit S1805 | — | — |
| Microposit S1818 (this page) | — | — |
| S1822 | — | — |
Troubleshooting
Common failure modes for Microposit S1818, answered from the manufacturer's datasheet and application notes. These are starting points — your substrate, tooling and environment shift the specifics, so calibrate on-tool.
How thick a film does MICROPOSIT S1818 G2 coat?
S1818 G2 is the thickest of the four undyed S1800 G2 grades — the top trace on the Figure 2 spin-speed chart. It runs from about 2.65 µm at 2,000 rpm down to 1.5 µm at 7,000 rpm. Maximum coating uniformity is typically attained between 3,500 and 5,500 rpm (a series-wide statement). These points are a figure read with roughly ±10–15% uncertainty, so confirm the target thickness on-tool.
SOURCE: MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and…
MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and Haas Electronic Materials, ME06N041 Rev. 0, October 2006) — Figure 2 undyed-series spin-speed curves, p.2
What exposure dose should I use for S1818 G2?
This datasheet publishes no exposure dose for S1818. The only quantified dose — 150 mJ/cm² sizing energy — is explicitly attributed to S1813 G2 and must not be borrowed for S1818. The series is exposable across 350–450 nm with properties optimized for 436 nm (g-line); pick a working dose by characterizing on-tool.
SOURCE: MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and…
MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and Haas Electronic Materials, ME06N041 Rev. 0, October 2006) — EXPOSURE section p.3; Table 9 (S1813-specific), p.4
What soft bake does S1818 G2 need?
The only soft-bake condition tied to S1818 is 115°C for 60 s on a hotplate — the coat condition used to generate its Figure 2 spin-speed trace (SVG 81 coater, measured on a Nanometrics 210). It is a documented test condition, not a separately stated grade-specific recommendation, so treat it as a starting point rather than an optimized bake.
SOURCE: MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and…
MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and Haas Electronic Materials, ME06N041 Rev. 0, October 2006) — Table 2, p.2
Does S1818 G2 need HMDS priming?
This is a family-generic answer — the datasheet gives no S1818-specific priming step. The S1800 G2 series works well with hexamethyldisilazane-based MICROPOSIT Primers: concentrated primer for vacuum vapour priming, diluted primer for liquid-phase priming. Prime oxide-forming substrates before coating.
SOURCE: MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and…
MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and Haas Electronic Materials, ME06N041 Rev. 0, October 2006) — SUBSTRATE PREPARATION, p.2
Why is there so little process data specific to S1818?
S1818 appears only once in this datasheet — as the highest trace on the undyed-series spin-speed chart (Figure 2). Every contrast curve, Dill parameter, masking-linearity and exposure/focus-latitude figure names S1813 G2 as the tested grade, so none of that data may be applied to S1818. Its spin curve is the only grade-specific quantitative data published.
SOURCE: MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and…
MICROPOSIT S1800 G2 Series Photoresists datasheet (Rohm and Haas Electronic Materials, ME06N041 Rev. 0, October 2006) — Figures 4–9 / Tables 4–9 (all S1813-specific)
Sources & disclaimer
- Rohm and Haas Electronic Materials — Microposit S1818 datasheet (ME06N041, Rev. 0, October 2006) · accessed 2026-07-10
- https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf — AMOLF-hosted mirror of the superseded ~1993 Shipley 'MPR S1800 1093' edition of the S1800 datasheet, archived here per the 2026-07-10 WL decision to re-extract S1818 from the current G2 edition instead; retained as a reference, not a data source for this recipe.
- https://aggiefab.tamu.edu/wp-content/uploads/2021/04/Microposit-S1818-G2-Positive-Photoresist-MSDS.pdf — Dow/Rohm and Haas MICROPOSIT S1818 MSDS states 'Mixed cresol novolak resin 15.0-25.0%, Diazo Photoactive Compound 1.0-10.0%'; the basis for classifying S1818 as dnq-novolak.
- Bonafe et al.. Dissipative charge transport in organic mixed ionic-electronic conductor channels. Nature Communications (2025). doi:10.1038/s41467-025-57528-9Patterns Microposit S1818 (4000 rpm for 60 s, 110 C for 1 min) by maskless direct-write lithography on an ML3 Microwriter to define metal contacts, then uses a second S1818 layer spun at 2000 rpm as the lift-off stencil for a PEDOT:PSS transistor channel.
- Arulanandam et al.. Fabrication methods for high reflectance dielectric-metal point contact rear mirror for optoelectronic devices. MethodsX (2022). doi:10.1016/j.mex.2022.101898A methods paper that prints its full Shipley S1818 spin-coat, photolithography and strip recipe as a step table, using the resist to open vias through a dielectric rear-mirror stack and to mask the subsequent electroplating step.
- Cheng et al.. Ultrathin Microlens Arrays for Dynamic Beam Shaping Based on 3D Lithography. Micromachines (2026). doi:10.3390/mi17020250Selects S1818 as the thin-film resist for a 3D-lithography microlens array, targeting a coat of roughly 1.6 um so that a 624 nm resist relief transfers, at the established etch selectivity, into an 800 nm structure depth in the substrate.
Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-07-26.