AR-P 5350 process recipe

Spin coating

AR-P 5350 is spin-coated to 1 µm. The curve below is redrawn from the manufacturer's published data — read your target thickness off the vertical axis and take the matching spin speed as a starting point.

Spin-speed-vs-thickness figure ('Spin curve', p.1, axes D₀/µm 0.0-12.0 vs rpm 0-8000) digitized 2026-07-12: two separately labeled traces, AR-P 5320 (upper) and AR-P 5350 (lower) — only the AR-P 5350 trace was digitized here, 7 diamond markers from 1000-7000 rpm (no marker at 5000 rpm; the trace does not extend to 8000 rpm). The figure's own 4000 rpm marker reads ≈1.01 µm, matching the Properties I table's 1.0 µm anchor closely (see spinCurves[0].source).

Soft bake

Soft bake

105 °C · 4 min · hotplate

Notes

105 °C, 4 min hot plate — confirmed identically in two places: the 'Process parameters' box (p.1, explicitly labeled 'AR-P 5350' worked example) and the 'Tempering' row of the process-conditions table (p.2, which also gives a convection-oven alternative: 100 °C, 40 min = 2400 s). Processing instructions (p.2) note: 'Higher tempering temperatures are required to produce the undercut' — the elevated bake (vs. a typical ~90–100 °C positive-resist softbake) is deliberate and load-bearing for the lift-off undercut profile, not incidental.Show more

SOURCE: "Process parameters" box, p.1 (AR-P 5350) + "Tempering" row, "Process conditions" table, p.2, of AR-P5300_english_Allresist_product_information.pdf

Exposure dose

The manufacturer publishes 55 mJ/cm² (Broadband UV, 365 nm, 405 nm, 436 nm). Dose scales with film thickness and depends on your optics, so treat it as a starting point and run a dose array.

As published

Broadband UV, 365 nm, 405 nm, 436 nm

Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.

SOURCE: "UV exposure" and "Exposure dose" rows, "Process conditions" table, p.2, AR-P 5350 column, of AR-P5300_english_Allresist_product_information.pdf

Development

Developer

AR 300-35 (primary, fully worked example); AR 300-26 or AR 300-47 listed as alternatives

Dilution

AR 300-35 at 1:2 (worked example); alternatively AR 300-26 at 1:7, or AR 300-47 at 2:3 — per the 'Development recommendations' table, AR-P 5350 row

Time

60 s

Method

puddle

Rinse

DI-H2O, 30 s

Developer family

Buffered alkaline

SOURCE: "Process parameters" box, p.1 (AR-P 5350) + "Development"/"Rinse" rows of the "Process conditions" table, p.2 + "Development recommendations" table, p.2 (AR-P 5350 row), of AR-P5300_english_Allresist_product_information.pdf

Hard bake, etch & strip

Etch resistance

Manufacturer states the series is 'plasma etching resistant, temperature stable up to 120 °C' (Characterisation, series-wide, p.1). A 'Plasma etching rates (nm/min)' table (5 Pa, 240–250 V bias: Ar-sputtering 7, O2 161, CF4 39, 80 CF4 + 16 O2 90) is given but is NOT labeled to a specific grade in this document (unlike the sibling AR-P 3500/3500T sheet, where an equivalent table WAS explicitly tagged). The glass-transition temperature (108 °C) and dielectric constant (3.1) given alongside it are numerically IDENTICAL to the same two fields in the AR-P 3500/3500T sheet, suggesting these may be generic Allresist-family boilerplate rather than AR-P 5350-specific measurements — flagged, not asserted as grade-specific.Show more

Stripper

AR 300-76 or O2 plasma ashing ("Removal" row, "Process conditions" table, p.2, shared/unsplit across both grades). The 'Process chemicals' box (p.1, series-wide) additionally lists AR 600-71 as an alternative remover.Show more

Storage

10–18 °C, approximately 6-month shelf life ("Storage 6 month (°C)" row, "Properties I" table, p.1 — a single value shared across the AR-P 5320 and AR-P 5350 columns).Show more

Not published for this resist: Hard bake, Descum — characterize on-tool.

Where it's used

AR-P 5350 is the thinner (1.0 µm at 4000 rpm), higher-contrast, higher-resolution (0.5 µm) grade of Allresist's AR-P 5300 series, a DNQ/novolac positive resist purpose-built for lift-off. Unlike most positive resists, an elevated softbake (105 °C, 4 min — well above a typical ~90–100 °C positive-resist prebake) deliberately produces the negative-sloped undercut profile needed for clean metal lift-off; the manufacturer states this explicitly ('higher tempering temperatures are required to produce the undercut'). Post-bake is explicitly 'Not required' for this series (process-conditions table, p.2) — recorded here as hardbake: null rather than an unread field. Development is aqueous-alkaline (AR 300-35, 1:2, 60 s in the fully worked example, confirmed twice in the document); AR 300-26 (1:7) and 'AR 300-47' (2:3) are named as alternatives with no stated time. The two-page source disagrees with itself on revision date: page 1's footer reads 'As of January 2018', page 2's reads 'As of January 2017' — both are preserved in provenance rather than silently reconciled.

Sources & disclaimer

• Allresist — AR-P 5350 datasheet (Inconsistent across pages: 'As of January 2018' (p.1 footer) vs. 'As of January 2017' (p.2 footer) — recorded verbatim, not reconciled.) · accessed 2026-07-10

Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-07-12.

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