AR-P 3510T process recipe

Spin coating

The manufacturer does not publish a spin curve for AR-P 3510T. The 'Spin curve' figure (p.1, bottom-left; axes: film thickness 1.0–6.0 µm vs. spin speed 0–8000 rpm) plots TWO traces, and per the manufacturer's OWN legend each trace already covers a combined pair of grades: 'AR-P 3510/3510 T' as one trace, 'AR-P 3540/3540 T' as the other — this document itself, not an extraction error, presents 3510 and 3510T as sharing one spin curve. This extraction did not read numeric points off the figure: the PDF's text layer surfaces only axis tick labels, not the underlying vector-curve geometry, and a low-confidence multi-grade read is worse than none (per the SU-8 2050 / LOR 3A precedents in this project). The only confirmed numeric anchor is 2.0 µm at 4000 rpm, 60 s spin time (from the 'Coating' row of the worked process-conditions table, p.1, 'AR-P 3510' column — unsplit for this grade pair per the Properties I table). No accel or edge-bead detail is published.

Soft bake

Soft bake

100 °C · 60 s · hotplate

Notes

'Tempering (± 1 °C): 100 °C, 1 min, hot plate OR 95 °C, 25 min, convection oven' — this row of the worked process-conditions table (p.1) is NOT split between the table's two example columns (AR-P 3510, AR-P 3540 T), i.e. it is presented as one shared condition for the worked AR-P 3500(T) example, which is why it is attributed to AR-P 3510T here despite that exact SKU not being one of the two labeled columns. Oven alternative: 95 °C for 25 min (1500 s).Show more

SOURCE: "Tempering" row, "Process conditions" table, p.1, of allresist_produktinfos_ar-p3500_3500t_englisch.pdf

Exposure dose

The manufacturer does not publish a clearing dose for AR-P 3510T. Determine it with a dose array on your own tool.

As published

Broadband UV, 365 nm, 405 nm, 436 nm

Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.

Development

Developer

AR 300-26 (1:2) or AR 300-35 (undiluted) or AR 300-44

Dilution

AR 300-26 at 1:2; AR 300-35 used undiluted; AR 300-44 listed as the third (ready-to-use) option — three alternative developer/dilution combinations named for the combined 'AR-P 3510 T, 3540 T' row of the 'Development recommendations' table (p.1). This differs from the base AR-P 3510/3540 row, which instead lists AR 300-26 at 1:5, AR 300-35 at 1:1, and 'AR 300-40 (300-47), 1:1'.Show more

Time

Not published — characterize on-tool

Method

puddle

Rinse

DI-H2O, 30 s

Developer family

TMAH-based

SOURCE: "Development recommendations" table (AR-P 3510 T, 3540 T row) + "Development"/"Rinse" rows of the "Process conditions" table, p.1, of allresist_produktinfos_ar-p3500_3500t_englisch.pdf

Hard bake, etch & strip

Hard bake

115 °C · 60 s

Descum

Not published — characterize on-tool

Etch resistance

Manufacturer states the AR-P 3500(T) series is 'plasma etching resistant, temperature-stable up to 120 °C' (Characterisation, series-wide, p.1). A 'Plasma etching rates (nm/min)' table (5 Pa, 240–250 V bias: Ar-sputtering 7, O2 165, CF4 37, 80 CF4 + 16 O2 88) is given but is grouped with the AR-P 3540T-labeled Cauchy coefficients, so it is not confirmed to represent AR-P 3510T specifically and is not carried into a numeric field here.Show more

Stripper

AR 300-70 or O2 plasma ashing ("Removal" row, "Process conditions" table, p.1 — unsplit, shared across the worked example). Note: a separate 'Process chemicals' box elsewhere on p.1, positioned alongside the AR-P 3540T worked example, instead lists 'Remover AR 300-76, T: AR 300-76' — that box is not confirmed to apply to AR-P 3510T and is not used as the primary value here.Show more

Storage

10–18 °C, approximately 6-month shelf life ("Storage 6 month (°C)" row, "Properties I" table, p.1 — a single value spanning both the 3510/3510T and 3540/3540T column groups).Show more

SOURCE: "Post-bake (optional)" row, "Process conditions" table, p.1, of allresist_produktinfos_ar-p3500_3500t_englisch.pdf

Where it's used

AR-P 3510T is the TMAH-compatible ('T') variant of Allresist's AR-P 3510 grade within the wider AR-P 3500(T) series, a classic DNQ/novolac positive resist for IC production with broadband UV / i-line / g-line sensitivity. The manufacturer states the 3500T sub-line is 'suitable for TMAH developer 0.26 n', distinguishing it from the base (non-T) grades. Several process parameters in this document are given only for the two SPECIFIC worked example columns the table actually labels — 'AR-P 3510' (base) and 'AR-P 3540 T' — and NOT for 'AR-P 3510 T' itself; most notably the exposure dose (55 vs. 120 mJ/cm² for the two shown grades) is clearly grade-sensitive, so no dose is recorded here rather than borrowing the base grade's number. By contrast, film thickness at 4000 rpm (2.0 µm) and the spin-curve figure are explicitly shared/combined between 3510 and 3510T by the manufacturer's own table structure and legend. A large block of dose-range, depth-of-focus, and SEM linearity/dark-field-erosion data on p.1 (bottom) and all of p.2 is explicitly labeled 'AR-P 3540 T' and belongs to that different grade, not to AR-P 3510T — excluded here despite the superficially similar SKU name.

Sources & disclaimer

• Allresist — AR-P 3510T datasheet (As of January 2014) · accessed 2026-07-10

Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-07-10.

Related recipes