https://nanyte.com/photoresists/mr-dwl-40 · last updated 2026-07-26
- Manufacturer
- micro resist technology GmbH
- Tone
- negative
- Chemistry
- Epoxy (SU-8 type)
- Thickness
- 20–100 µm
- Developer
- mr-Dev 600
- Applications
- Etch mask · Electroplating / molding · General prototyping · MEMS structural
- Substrate
- Resist
- Exposed
Spin coating
The manufacturer does not publish a spin curve for mr-DWL 40.
- No spin-speed-vs-thickness table or figure is published for mr-DWL anywhere in this flyer — only the stated achievable film-thickness range per grade.
- No accel, dispense, or edge-bead guidance is given either.
- This is expected: the source is a multi-series marketing flyer, not a technical datasheet.
- Adhesion
- HMDS not required — Not addressed in this flyer.
Soft bake
- Soft bake
- Not published — characterize on-tool
Exposure dose
mr-DWL 40 is sold for 405 nm direct laser writing, but no dose is published at any wavelength — only a qualitative claim of high sensitivity above 400 nm, and an absorption curve with no dose calibration on its axis. Run a dose array on your own tool to land the working dose.
Not published for this resist: Dose at 365 nm, Dose at 405 nm — characterize on-tool.
Development
- Developer
- mr-Dev 600
- Developer family
- Solvent
Not published for this resist: Dilution, Time, Method, Rinse — characterize on-tool.
SOURCE: mr-DWL table, p.4 of Negative Photoresists flyer
Hard bake, etch & strip
- Etch resistance
- "Etch mask for wet and dry etch processes" (Main applications, mr-DWL section, p.4).
Not published for this resist: Hard bake, Descum, Stripper, Storage — characterize on-tool.
Where it's used
Practical notes from the datasheet
mr-DWL 40 is the mid-thickness grade of micro resist technology's mr-DWL negative-tone resist series, formulated for 405 nm exposure in direct laser writing (DLW) and two-photon polymerization (2PP) tools, and sold ready-to-use for coatings from 20 to 100 µm. The only source retrievable for this SKU is a multi-series marketing flyer rather than a full technical datasheet, so process parameters a TDS would normally publish — softbake, exposure dose, post-exposure bake, and a spin-speed-vs-thickness curve — are not stated in it; mr-DWL's own TDS is served behind a non-guessable microresist.de download link and was not retrievable. The flyer names mr-Dev 600 as the developer (solvent-based) but gives no dilution, time, or method. Because mr-DWL is marketed specifically for 405 nm direct-write exposure, its h-line dose could in principle be the operationally relevant one, but no dose value in mJ/cm² is published for this SKU in this document, so no dose is quoted for it. Chemistry classified as epoxy from microresist.de's description of mr-DWL as chemically amplified negative tone sharing SU-8's advantageous properties, corroborated by peer-reviewed literature grouping SU-8 and mr-DWL as epoxy-based photoresists.
Sources & disclaimer
- micro resist technology GmbH — mr-DWL 40 datasheet (August 2022) · accessed 2026-07-10
- https://microresist.de/en/produkt/mr-dwl-series/ — microresist.de describes mr-DWL as 'chemically amplified negative tone... shares several advantageous properties with SU-8', and peer-reviewed literature groups 'epoxy-based photoresists SU-8 and mr-DWL' together; the basis for classifying mr-DWL 40 as epoxy.
- Sato et al.. Pneumatic Microballoons for Active Control of the Vibration-Induced Flow. Micromachines (2023). doi:10.3390/mi14112010Builds the master mold for a pneumatic microballoon actuator's air-channel structures in mr-DWL 40, patterned by direct lithography on a DL-1000 maskless writer, then replicates the mold in PDMS.
- Dupuit et al.. Portrait of intense communications within microfluidic neural networks. Scientific Reports (2023). doi:10.1038/s41598-023-39477-9Lithographs neuron culture chambers and microchannels in two mr-DWL layers of 40 um and 5 um using backside alignment, hard-bakes the mold at 180 C, and casts PDMS from it to guide cortical network growth.
- Bhujbal et al.. Effect of design geometry, exposure energy, cytophilic molecules, cell type and load in fabrication of single-cell arrays using micro-contact printing. Scientific Reports (2020). doi:10.1038/s41598-020-72080-wMaps how exposure energy on an MLA-150 maskless aligner changes the transferred feature dimensions of an mr-DWL negative resist, then stamps the resulting PDMS moulds into single-cell arrays.
Manufacturer datasheet values are starting points; optimal parameters depend on your substrate, equipment and environment. Product names and trademarks belong to their respective owners. NANYTE is not affiliated with the manufacturers listed. Last updated 2026-07-26.